Revista UIS Ingenierías

Vol. 23 No. 1 (2024): Revista UIS Ingenierías
Articles

Carbon nanotubes grown by plasma enhanced chemical vapor deposition of acetylene in the presence of water vapor

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  • Júlia Sancho-Tapia,
  • Enric Bertran-Sierra,
  • Rogelio Ospina
Júlia Sancho-Tapia
Universidad de Barcelona
Enric Bertran-Sierra
Universidad de Barcelona
Rogelio Ospina
Universidad Industrial de Santander
DOI: https://doi.org/10.18273/revuin.v23n1-2024004

Published 2024-02-11

Keywords

  • carbon nanotubes,
  • plasma-enhanced chemical vapor deposition,
  • water-assisted PECVD

How to Cite

Sancho-Tapia, J., Bertran-Sierra, E. ., & Ospina, R. . (2024). Carbon nanotubes grown by plasma enhanced chemical vapor deposition of acetylene in the presence of water vapor. Revista UIS Ingenierías, 23(1), 39–46. https://doi.org/10.18273/revuin.v23n1-2024004

Copyright (c) 2024 Revista UIS Ingenierías

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This work is licensed under a Creative Commons Attribution-NoDerivatives 4.0 International License.

Abstract

Carbon nanotubes can be synthesized using various techniques. This work aims to study the experimental process of growing carbon nanotubes via plasma-enhanced chemical vapor deposition (PECVD). Additionally, the study aims to calibrate the reactor and develop a LabVIEW code to introduce water into the process, enabling a water-assisted PECVD procedure. The obtained samples are evaluated through the analysis of SEM images and Raman spectra.

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